Exhaust Gas Conditioning System

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Chemical Vapor Deposition processes require the use of flammable, toxic, or pyrophoric gases, as well as other potentially hazardous materials, in order to achieve the desired properties of the film being deposited or grown. Not all of the gases introduced into the reaction chamber are consumed by the deposition process, and many of these gases remain in the exhaust stream in various concentrations after passing through the deposition chamber. Environmental and safety regulations necessitate the post deposition combustion and/or neutralization of the unconsumed materials in the gas stream before being released into the atmosphere.

CVD Equipment Corporation provides several models of Exhaust Gas Conditioning (EGC) systems for waste gas treatment; EasyExhaust™ Pyrolizing Furnace / Burn Box, the ExhaustGas™ 400, and the ExhaustGas™ 600.

The EasyExhaust™ Pyrolizing Furnace / Burn Box combusts all flammable gases such as H₂, and hydrocarbons. Utilizing high temperature in an atmospheric environment it renders the gases to a safe state for introduction into a facility exhaust system or directly into the atmosphere. The burn box can be mounted onto the process equipment to save on valuable floor space.

The ExhaustGas™ 400 advanced exhaust gas conditioning system employs a high temperature pyrolizing furnace and a water scrubbing system to ensure the proper combustion and neutralization of all exhaust gases. Integration of the EGC 400 control system into the process equipment reduces cost and provides seamless operation through the primary user interface. The EGC 400/410 can treat up to 20 SLPM of H² or equivalent gases.

The EGC 410 is configured as a standalone system with its own controller to be used in support process equipment provided by CVD Equipment or other process equipment vendors.

The ExhaustGas™ 400 series advanced exhaust gas conditioning system employs a high temperature pyrolizing furnace and a water scrubbing system to ensure the proper combustion and neutralization of all exhaust gases. The EGC 400 is configured as a standalone system with its own controller to be used in support process equipment provided by CVD Equipment or other process equipment vendors. EGC 410’s control system is integrated into the process equipment to reduce cost and provide seamless operation through the primary user interface. The EGC 400/410 can treat up to 20 SLPM of H² or equivalent gases. The EGC 600/610 utilizes the same principles as the EGC 400/410 but with a higher capacity reaction chamber and piping to accommodate up to 50 SLPM H² or equivalent gas. The EGC 600 has its own controller while EGC 610’s control system is integrated into process equipment.

Please contact us for further details.