Customized Equipment & Process Solutions

Founded in 1982, CVD Equipment Corporation has been providing research systems and production tools to manufacturers, universities and laboratories worldwide. 

Our products consist of a complete array of Chemical Vapor Deposition (CVD) Systems including:

• Atmospheric Pressure Chemical Vapor Deposition (APCVD)
• Low Pressure Chemical Vapor Deposition (LPCVD)
• Metalorganic Chemical Vapor Deposition (MOCVD)
• Plasma Enhanced Chemical Vapor Deposition (PECVD)
• Ultra High Vacuum Chemical Vapor Deposition (UHVCVD)

Systems can be configured as single-tube or multi-tube stacks, multi-chamber cluster tools, or reel-to-reel. 

We also offer a complete line of products for:

• Atomic Layer Deposition (ALD)
• Diffusion Furnaces
• Oxidation Furnaces
• Liquid Phase Epitaxial (LPE) processing
• Rapid Thermal Annealing (RTA/RTP)
• Selenization/Sulfurization
• Si-Precursor QC For Polysilicon Production (SiQC)
• Dry Etching

Support Equipment & Parts

Additionally, we provide support equipment and parts including gas cabinets, scrubbers, quartzware, bubblers and motion control/vacuum chambers. Our strong capability and extensive experience make CVD Equipment Corporation the best place to look for complete solutions for your research and production needs.

Innovative Solutions

Our expertise is unparalleled in controlling temperature, pressure, and gas flow.  System designs allow for several process heating options including resistance, induction or infra-red heating, as well as a wide range of operational pressures from Ultra High Vacuum (UHV) to 50 Atmospheres.  Our equipment is designed and manufactured to meet today’s most stringent safety standards and is equipped with comprehensive hardware and software interlocks to ensure operational safety. 

Please contact us for further details.