Semiconductor/MEMS

Thin Film materials are the foundation of the Semiconductor and MEMS technology. CVD is the most commonly used method for thin film deposition. These thin film materials have various forms including mono-crystalline, poly-crystalline, amorphous, and epitaxial. The materials include Si, Ge, SiGe, Silicon Nitride, Silicon Oxide, Silicon Carbide, other oxides and nitrides, metals and many more.

We also manufacture starter wafers for nMEMS applications using our CVDGraphene™ process. All our CVDGraphene™ products are available through our wholly owned subsidiary, CVD Materials Corporation

Please contact us for further details.