Papers

Download APCVD SiCxOy Deposition

Symposium BB: Green Chemistry in Research and Development of Advanced Materials

Author(s):
Christopher Jensen¹, T. Salagaj¹, K. Strobl¹, M. Davies¹
¹CVD Equipment Corporation, 1860 Smithtown Ave., Ronkonkoma, NY 11779
²Sixtron Advanced Materials, 1785 Rte Trans Canada, Dorval (Quebec), Canada H9P 1J1

We report on the experimental investigation of the use of Sixtron Advanced Materials Silane-free gas generation system to deposit a transparent SiCxOy Na diffusion barrier and anti-reflection film onto glass sheets with an APCVD deposition process. SiCxOy thin films (50-250nm thickness) with a tunable index of 1.65-1.75 are currently being deposited by APCVD On-Line float glass coating systems depositing TCO (Transparent Conductive Oxide) coatings (both for Low-E windows and for solar panel manufacturing applications) using, for example, gaseous Silane (SiH4), Propane and Oxygen. They are critical for achieving high conductivity and to improve the longevity of the TCO coating performance and act both as Na-diffusion barrier layer and anti-reflection single layer film having an intermediate index. Sixtron’s gas generation system uses a solid that is safe for shipping and thus removes many of the safety concerns involved with shipping and exchanging hazardous Silane gas cylinders at the thin film production site. A successful transfer of this alternative Si-precursor material to the proprietary CVDgCoat™; APCVD coating platform would enable the manufacturing and operation of safer and lower cost On-line and Off-line APCVD thin film glass coating systems for the fast growing coated glass sheet market driven by the growing alternative energy demand for both energy saving and energy generation material.